Laboratory for Advanced Mist Deposition Technology

2_7advancedmist2.png

Laboratory Overview

Laboratory Objectives

Our life is supported by a variety of electronic elements (devices). In the manufacture of electronic elements, the front-end processes are the most important, and among front-end processes, thin film formation requires the most advanced technological development.
Therefore, in order to establish technology that will improve the performance of electronic elements through developments in thin-film formation technology, this laboratory plans to develop techniques for controlling the nature of the very materials that make up the elements, as well as the state of the bonding interface between the materials.
To that end, we will conduct research into the fabrication and evaluation of each functional film and element; strive to develop mechanisms for improving each property, from both experimental and computational standpoints; and conduct research aimed at establishing next-generation functional film formation technology that can optimize the properties of the target materials.

Research Direction and Future Prospects

In this laboratory, we develop technologies for epitaxial growth of thin films of various oxides (particularly Ga and Zn), focusing on "mist chemical vapor deposition (CVD)," a solution-based method for synthesis of functional films at atmospheric pressure; and on technologies to suppress and reduce the occurrence of defects in these those films; and use those technologies to create devices.
In addition, by providing general-purpose research equipment to companies and researchers who wish to synthesize functional films using mist coating or mist CVD, we will obtain budgets for the promotion of collaborative research and publish the results as papers.

We will focus on the following four main themes:

1. Extension of conventional methods

The aim is to establish technology for the synthesis of functional films with low defect density, using the mist CVD method.

2. Development of new technologies

We will work to develop new synthesis technologies for functional films to replace homo- and hetero-epitaxial growth.

3. Leverage the advantages of mist CVD

Establishment of technology to reduce interface defects.

4. Engage in worldwide research exchange

We will create a system that allows researchers around the world to use general-purpose research equipment.