Faculty Members

LANGUAGE ≫ Japanese


Areas of specialization
Laboratory/research office Lab. of Material Innovation & Sustainable TechnologyLab. of MIST
1.Physics research of mist droplets. 2.Research & development of novel technology using mist droplets. 3.Research & Development of novel functional thin film fabrication technique under atmospheric pressure. 4.Fabrication and properties' evaluation of thin film. 5.Fabrication and characteristics' evaluation of thin film devices.
Current research topics
Educational background
Professional background
Academic societies

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* Courses provided in English are shown with (E) mark

Undergraduate school
  • Graduation Thesis
  • Basic Thermodynamics
  • Advanced Thermodynamics for Engineering
  • English for Engineering
Graduate school
  • Applied Thermodynamics
  • Individual Work for Graduate
  • Seminar 1
  • Seminar 3
  • Advanced Seminar 1
  • Advanced Seminar 2

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Research activities

Research papers
  1. Authors: Xiaojiao Liu, Dang Thai Giang, Liu Li, Toshiyuki Kawaharamura
    Title: Fabrication of Zn1-xMgxO/AgyO heterojunction diodes by mist CVD at atmospheric pressure
    Journal: Applied Surface Science, Vol. 596, p. 153465
    Year: 2022
  2. Authors: Dang Thai Giang, Tatsuya Yasuoka, Toshiyuki Kawaharamura
    Title: Sub-μm features patterned with laser interference lithography for the epitaxial lateral overgrowth of α-Ga2O3 via mist chemical vapor deposition
    Journal: Applied Physics Letters, Vol. 119, p. 041902
    Year: 2021
  3. Authors: Liu Li, Toshiyuki Kawaharamura, Masahito Sakamoto, Misaki Nishi, Dang Thai Giang, Shota Sato
    Title: The Quality Improvement of Yttrium Oxide Thin Films Grown at Low Temperature via the Third-Generation Mist Chemical Vapor Deposition Using Oxygen-Supporting Sources
    Journal: PHYSICA STATUS SOLIDI B , Vol. 2021, p. 2100105
    Year: 2021
  4. Authors: Tatsuya Yasuoka, Liu Li, Tamako Ozaki, Kanta Asako, Yuna Ishikawa, Miyabi Fukue, Dang Thai Giang, Toshiyuki Kawaharamura
    Title: The effect of HCl on the α-Ga2O3 thin films fabricated by third generation mist chemical vapor deposition
    Journal: AIP Advances, Vol. 11, p. 045123
    Year: 2021
  5. Authors: Leila Ghadbeigi, Jacqueline Cooke, Dang Thai Giang, Toshiyuki Kawaharamura, Tatsuya Yasuoka, Rujun Sun, Praneeth Ranga, Sriram Krishnamoorthy, Michael A. Scarpulla, Berardi Sensale-Rodriguez
    Title: Optical Characterization of Gallium Oxide α and β Polymorph Thin-Films Grown on c-Plane Sapphire
    Journal: Journal of Electronic Materials, Vol. 50, pp. 2990-2998
    Year: 2021
  6. Authors: Dang Thai Giang, Yuki Tagashira, Tatsuya Yasuoka, Liu Li, Toshiyuki Kawaharamura
    Title: Conductive Si-doped α-(AlxGa1-x)2O3 Thin Films with the Band Gaps up to 6.22 eV
    Journal: AIP Advances , Vol. 10, p. 115019
    Year: 2020
  7. Authors: Dang Thai Giang, Shota Sato, Yuki Tagashira, Tatsuya Yasuoka, Liu Li, Toshiyuki Kawaharamura
    Title: α-(AlxGa1−x)2O3 single-layer and heterostructure buffers for the growth of conductive Sn-doped α-Ga2O3 thin films via mist chemical vapor deposition
    Journal: APL Mater., Vol. 8, p. 101101
    Year: 2020
  8. Authors: Daisuke Tahara, Hiroyuki Nishinaka, Shota Sato, Liu Li, Toshiyuki Kawaharamura, Masahiro Yoshimoto, Minoru Noda
    Title: Mist chemical vapor deposition study of 20 and 100 nm thick undoped ferroelectric hafnium oxide films on n+-Si(100) substrates
    Journal: Japanese Journal of Applied Physics, Vol. 58, p. SLLB10
    Year: 2019
  9. Authors: Dang Thai Giang, Martin Allen, Mamoru Furuta, Toshiyuki Kawaharamura
    Title: Electronic devices fabricated on mist-CVD-grown oxide semiconductors and their applications
    Journal: Japanese Journal of Applied Physics, Vol. 58, p. 090606
    Year: 2019
  10. Authors: Phimolphan Rutthongjan, Misaki Nishi, Liu Li, Shota Sato, Yuya Okada, Dang Thai Giang, Toshiyuki Kawaharamura
    Title: Growth mechanism of Zinc Oxide thin film by mist chemical vapor deposition via the modulation of [H2O]/[Zn] ratios
    Journal: Appl. Phys. Express, Vol. 12, p. 065505
    Year: 2019
  11. Authors: Phimolphan Rutthongjan, LI LIU, Misaki Nishi, Masahito Sakamoto, Shota Sato, Ellawala Kankanamge Chandima Pradeep, Dang Thai Giang, Toshiyuki Kawaharamura
    Title: Composition control of Zn1-xMgxO thin films grown using mist chemical vapor deposition
    Journal: Japanese Journal of Applied Physics, Vol. 58, p. 035503
    Year: 2019
  12. Authors: Li Liu, Toshiyuki Kawaharamura, Dang Thai Giang, Ellawala Kankanamge Chandima Pradeep, Shota Sato, Takayuki Uchida, Shizuo Fujita, Takahiro Hiramatsu, Hiroshi Kobayashi, Hiroyuki Orita
    Title: Study on fabrication of conductive antimony doped tin oxide thin films (SnOx:Sb) by 3rd generation mist chemical vapor deposition
    Journal: Japanese Journal of Applied Physics, Vol. 58, p. 025502
    Year: 2019
  13. Authors: Dang Thai Giang, Yuta Suwa, Masahito Sakamoto, Li Liu, Phimolphan Rutthongjan, Shota Sato, Tatsuya Yasuoka, Ryo Hasegawa, Toshiyuki Kawaharamura
    Title: Growth of α-Cr2O3 single crystals by mist CVD using ammonium dichromate
    Journal: Applied Physics Express, Vol. 11, p. 111101, The Japan Society of Applied Physics
    Year: 2018
  14. Authors: Giang T. Dang, Tatsuya Yasuoka, Yuki Tagashira, Toshiyasu Tadokoro, Wolfgang Theiss, Toshiyuki Kawaharamura
    Title: Bandgap engineering of α-(AlxGa1-x)2O3 by a mist chemical vapor deposition two-chamber system and verification of Vegard's Law
    Journal: Appl. Phys. Lett., Vol. 113, p. 062102
    Year: 2018
  15. Authors: Ellawala Kankanamge Chandima Pradeep, Masataka Ohtani, Kazuya Kobiro, Toshiyuki Kawaharamura
    Title: Single-step simple solvothermal synthetic approach to ultra-fine MgO nanocrystals using high-temperature and high-pressure acetonitrile
    Journal: Chem. Lett., Vol. 46, pp. 940-943
    Year: 2017
  16. Authors: KAWAHARAMURA Toshiyuki, Dang Thai Giang, NITTA Noriko
    Title: Atmospheric-Pressure Epitaxial Growth Technique of a Multiple Quantum Well by Mist Chemical Vapor Deposition based on Leidenfrost droplets
    Journal: Appl. Phys. Lett., Vol. 109, No. 15, AIP Publishing Journals
    Year: 2016
  17. Authors: Chandan Biswas, Zhu Ma, Xiaodan Zhu, KAWAHARAMURA Toshiyuki, Kang L. Wang
    Title: Atmospheric growth of hybrid ZnO thin films for inverted polymer solar cells
    Journal: Solar Energy Materials and Solar Cells, Vol. 157, pp. 1048-1056
    Year: 2016
  18. Authors: Giang T. Dang, Takayuki Uchida, KAWAHARAMURA Toshiyuki, FURUTA Mamoru, Adam R. Hyndman, Rodrigo Martinez, Shizuo Fujita, Roger J. Reeves, Martin W. Allen
    Title: Silver Oxide Schottky Contacts and Metal Semiconductor Field-Effect Transistors on SnO2 thin films
    Journal: Applied Physics Express, Vol. 9, p. 041101, the Japan Society for the Promotion of Science
    Year: 2016
  19. Authors: Shirahata Takahiro, KAWAHARAMURA Toshiyuki, Fujita Shizuo, Orita Hiroyuki
    Title: Transparent conductive zinc-oxide-based films grown at low temperature by mist chemical vapor deposition
    Journal: Thin Solid Film, Vol. 597, pp. 30-38, Elsevier
    Year: 2015
  20. Authors: Xiaodan Zhu, KAWAHARAMURA Toshiyuki, Adam Z Stieg, Chandan Biswas, Lu Li, Zhu Ma, Mark A. Zurbuchen, Qibing Pei, Kang L Wang
    Title: Atmospheric and Aqueous Deposition of Polycrystalline Metal Oxides Using Mist-CVD for Highly Efficient Inverted Polymer Solar Cells
    Journal: Nano Letters, Vol. 15, pp. 4948-4954, American Chemical Society
    Year: 2015
  21. Authors: Giang T. Dang, KAWAHARAMURA Toshiyuki, FURUTA Mamoru, Martin W. Allen
    Title: Metal-Semiconductor Field-Effect Transistors With In–Ga–Zn–O Channel Grown by Nonvacuum-Processed Mist Chemical Vapor Deposition
    Journal: Electron Device Letters, IEEE, Vol. 36, No. 5, pp. 463-465, IEEE
    Year: 2015
  22. Authors: KAWAHARAMURA Toshiyuki
    Title: Physics on development of open-air atmospheric pressure thin film fabrication technique using mist droplets; control of precursor flow
    Journal: Jpn. J. Appl. Phys., Vol. 53, No. 5S1, p. 05FF08
    Year: 2014
  23. Authors: Shizuo Fujita, Kentaro Kaneko, Takumi Ikenoue, KAWAHARAMURA Toshiyuki, FURUTA Mamoru
    Title: Ultrasonic-assisted mist chemical vapor deposition of II-oxide and related oxide compounds
    Journal: physica status solidi (c), Vol. 11, No. 7-8, pp. 1225-1228
    Year: 2014
  24. Authors: Takayuki Uchida, KAWAHARAMURA Toshiyuki, Kenji Shibayama, Shizuo Fujita, Takahiro Hiramatsu, Hiroyuki Orita
    Title: Mist chemical vapor deposition of aluminum oxide thin films for rear surface passivation of crystalline silicon solar cells
    Journal: Applied Physics Express, Vol. 7, No. 2, p. 021303
    Year: 2014
  25. Authors: FURUTA Mamoru, KAWAHARAMURA Toshiyuki, WANGDapeng, Tatsuya Toda, HIRAO Takashi
    Title: Electrical Properties of the Thin-Film Transistor With an Indium–Gallium–Zinc Oxide Channel and an Aluminium Oxide Gate Dielectric Stack Formed by Solution-Based Atmospheric Pressure Deposition
    Journal: IEEE Electron Device Letters, Vol. 33, No. 6, pp. 851-853, IEEE
    Year: 2012
  26. Authors: KAWAHARAMURA Toshiyuki, Tai Jan Dan, FURUTA Mamoru
    Title: Successful Growth of Conductive Highly Crystalline Sn-Doped a-Ga2O3 Thin Films by Fine-Channel Mist Chemical Vapor Deposition
    Journal: Japanese Journal of Applied Physics, Vol. 51, pp. 040207-1-040207-3, Japan Society of Applied Physics 
    Year: 2012
  27. Authors: S. Shimakawa, Y. Kamada, KAWAHARAMURA Toshiyuki, WANGDapeng, LI Chaoyang, S. Fujita, HIRAO Takashi, FURUTA Mamoru
    Title: Photo-Leakage Current of Thin-Film Transistors with ZnO Channels Formed at Various Oxygen Partial Pressures under Visible Light Irradiation
    Journal: Japanese Journal of Applied Physics, Vol. 51, pp. 03CB04-1-03CB04-4, Japan Society of Applied Physics 
    Year: 2012
  28. Authors: MOMOTA Sadao, Jango Hangu, Takuya Toyonaga, Hikaru Terauchi, Kazuki Maeda, Jun Taniguchi, HIRAO Takashi, FURUTA Mamoru, KAWAHARAMURA Toshiyuki
    Title: Control of swelling height of Si crystal by irradiating Ar beam
    Journal: Journal of Nanoscience and Nanotechnology, Vol. 12, No. 1, pp. 552-556, American Scientific Publishers
    Year: 2012
  29. Authors: Tai Jan Dan, KAWAHARAMURA Toshiyuki, NITTA Noriko, HIRAO Takashi, T. Yoshiie, TANIWAKI Masafumi
    Title: Photoluminescence, morphology, and structure of hydrothermal ZnO implanted at room temperature with 60 keV Sn ions
    Journal: J. Appl. Phys., Vol. 109, p. 123516
    Year: 2011
  30. Authors: Tai Jan Dan, KAWAHARAMURA Toshiyuki, HIRAO Takashi, NITTA Noriko, TANIWAKI Masafumi
    Title: Characteristics of ZnO Wafers Implanted with 60 keV Sn+ Ions at Room Temperature and at 110 K
    Journal: AIP Conference Proceedings , Vol. 1321, pp. 270-273, American Institute of Physics
    Year: 2011
  31. Authors: H. Furuta, T. Kawaharamura, M. Furuta, K. Kawabata, T. Hirao, T. Komukai, K. Yoshihara, Y. Shimomoto, T. Oguchi
    Title: Crystal Structure Analysis of Multiwalled Carbon Nanotube Forests by Newly Developed Cross-Sectional XRD Measurement
    Journal: Applied Physics Express, Vol. 3, pp. 105101-1-105101-3, The Japan Society of Applied Physics
    Year: 2010
  32. Authors: H. Furuta, T. Kawaharamura, K. Kawabata, M. Furuta, T. Matsuda, C. Li, T. Hirao
    Title: High-Density Short-Height Directly Grown CNT Patterned Emitter on Glass
    Journal: e-Journal of Surface Science and Nanotechnology, Vol. 8, pp. 336-339, The Surface Science Society of Japan
    Year: 2010
  33. Authors: T. Hiramatsu, T. Matsuda, H. Furuta, H. Nitta, T. Kawaharamura, C. Li, M. Furuta, T. Hirao
    Title: Effect of Pulsed Substrate Bias on Film Properties of SiO2 Deposited by Inductively Coupled Plasma Deposition
    Journal: Japanese Journal Applied Physics, Vol. 49, pp. 03CA03-1-03CA03-4
    Year: 2010
  34. Authors: FURUTA Mamoru, T. Nakanishi, M. Kimura, T. Hiramatsu, T. Matsuda, KAWAHARAMURA Toshiyuki, FURUTA Hiroshi, HIRAO Takashi
    Title: Effect of Surface Treatment of Gate-insulator on Uniformity in Bottom-gate ZnO Thin-film Transistors
    Journal: Electrochemical and Solid-State Letters, Vol. 13, pp. H101-H104
    Year: 2010
  35. Authors: Chaoyang Li, Tokiyoshi Matsuda, Toshiyuki Kawaharamura, Hiroshi Furuta, Mamoru Furuta, Takahiro Hiramatsu, Takashi Hirao, Yoichiro Nakanishi, Keiji Ichi
    Title: Comparison of structural and photoluminescence properties of ZnO nano-structures influenced by gas ratio and substrate bias during radio frequency sputtering
    Journal: J. Vac. Sci. Technol. B, Vol. 28, No. 2, pp. C2B51-55
    Year: 2010
  36. Authors: Chaoyang Li, Toshiyuki Kawaharamura, Tokiyoshi Matsuda, Hiroshi Furuta, Takahiro Hiramatsu, FURUTA Mamoru, Takashi Hirao
    Title: Intense green cathodoluminescence from low-temperature-deposited ZnO film with fluted hexagonal cone nanostructures
    Journal: Appl. Phys. Express, Vol. 2, pp. 091601-091603
    Year: 2009
  37. Authors: Toshiyuki Kawaharamura, Shizuo Fujita
    Title: An approach of making single crystalline zinc oxide thin film with fine channel mist chemical vapor deposition method
    Journal: Physica Stat. Sol. (c), Vol. 5, pp. 3138-3140
    Year: 2008
  38. Authors: Toshiyuki Kawaharamura, Hiroyuki Nishinaka, Jian-Guo Lu, Yudai Kamada, Yoshio Masuda, Shizuo Fujita
    Title: Mist CVD growth of ZnO-based thin films and nanostructures
    Journal: J. Korean Physical Society, Vol. 53, pp. 2976-2980
    Year: 2008
  39. Authors: Toshiyuki Kawaharamura, Hiroyuki Nishinaka, Shizuo Fujita
    Title: Growth of crystalline zinc oxide thin films by fine channel mist chemical vapor deposition
    Journal: Jpn. J. Appl. Phys., Vol. 47, pp. 4669-4675
    Year: 2008
  40. Authors: K. Ozga, KAWAHARAMURA Toshiyuki, A. AliUmar, M. Oyama, K. Nouneh, A Slezak, S. Fujita, M. Piasecki, A. H. Reshak, I. V. Kityk
    Title: Second order optical effects in Au nanoparticle-deposited ZnO nanocrystallite films
    Journal: Nanotechnology, Vol. 19, pp. 185709-1-185709-6
    Year: 2008
  41. Authors: Jian-Guo Lu, KAWAHARAMURA Toshiyuki, Hiroyuki Nishinaka, Shizuo Fujita
    Title: Roles of hydrogen and nitrogen in p-type doping of ZnO
    Journal: Chemical Physics Letters, Vol. 441, pp. 68-71
    Year: 2007
  42. Authors: Hiroyuki Nishinaka, KAWAHARAMURA Toshiyuki, Shizuo Fujita
    Title: Low-temperature growth of ZnO thin films by linear source utrasonic spray chemical vapor deposition
    Journal: Japanese Journal of Applied Physics, Vol. 46, pp. 6811-6813
    Year: 2007
  43. Authors: Jian-Guo Lu, KAWAHARAMURA Toshiyuki, Hiroyuki Nishinaka, Yudai Kamada, Takayoshi Oshima, Shizuo Fujita
    Title: ZnO-based thin films synthesized by atmospheric pressure mist chemical vapor deposition
    Journal: Journal of Crystal Growth, Vol. 299, pp. 1-10
    Year: 2007
  44. Authors: Yudai Kamada, KAWAHARAMURA Toshiyuki, Hiroyuki Nishinaka, Shizuo Fujita
    Title: Fabrication of ZnO and ZnMgO thin films and UV photodetectors by mist chemical vapor deposition method
    Journal: Mater. Res. Soc. Symp. Proc., Vol. 957, p. K07-27
    Year: 2007
  45. Authors: Yudai Kamada, KAWAHARAMURA Toshiyuki, Hiroyuki Nishinaka, Shizuo Fujita
    Title: Linear-source ultrasonic spray chemical vapor deposition method for fabrication of ZnMgO films and ultraviolet photodetectors
    Journal: Japanese Journal of Applied Physics, Vol. 45, pp. L857-L859
    Year: 2006
  46. Authors: Jian-Guo Lu, KAWAHARAMURA Toshiyuki, Hiroyuki Nishinaka, Yudai Kamada, Takayoshi Oshima, Shizuo Fujita
    Title: Carrier concentrationinduced band-gap shift in Al-doped Zn1-xMgxO thin films
    Journal: Applied Physics Letters, Vol. 89, pp. 262107_1-262107_3
    Year: 2006
Invited lectures
  1. Fabrication and characterization of the metal oxide thin film by mist CVD, the 2022 E-MRS Fall Meeting and Exhibit, online, 2022
  2. Growth Mechanism of mist CVD, the 2022 Spring Meeting of the European Materials Research Society (E-MRS), a VIRTUAL Conference , 2022
  3. Growth Mechanism of mist CVD, Materials Research Meeting 2019 (MRM 2019), Yokohama Symposia, Yokohama, Japan, 2019
  4. Physics on development of open-air atmospheric pressure thin film fabrication technique using mist droplets: Control of precursor flow, The 76th JSAP Autumn Meeting, 2015, Nagoya Congress Center, Nagoya, 2015
  5. Fabrication of Functional Thin Films and Electrical Devices by Mist CVD Equipping Highly Accurate Flow Control Technology under Atmospheric Pressure, AWAD, Jeju, Korea, 2015
  1. The 37th JSAP Outstanding Paper Award, 2015, JSAP Young Scientist Award, JSAP, 2015
  2. 2014 JSAP Poster Award, The Japan Society of Applied Physics, 2014
Grants-in-Aid for Scientific Research from the Japanese government
  1. Project title: Application technology development harnessing mist characteristics-The mist method for fabrication technology of electronic devices-
    Category: Grant-in-Aid for Young Scientists (B)
    Project number: 22760232
    Project period: 2010-2011
    Total budget amount: 4,290,000 yen
  2. Project title: Basic behavior analysis of the Leidenfrost droplet toward the functional thin film fabrication on the three-dimensional object
    Category: Grant-in-Aid for Challenging Exploratory Research
    Project number: 26630395
    Project period: 2014-2015
    Total budget amount: 4,030,000 yen
  3. Project title: Development of next generation mist CVD enabling atomic level control & development of oxide quantum devices
    Category: Grant-in-Aid for Young Scientists (A)
    Project number: 15H05421
    Project period: 2015-2018
    Total budget amount: 21,190,000 yen
  4. Project title: Basic research on nanostructure control for the fabrication of ultra-wide bandgap oxide quantum devices by mist CVD
    Category: Grant-in-Aid for Scientific Research (B)
    Project number: 18H01873
    Project period: 2018-2021
    Total budget amount: 17,810,000 yen

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Social activities

Committee roles
  1. Secretary of Program Committee, International Conference on Solid State Devices and Materials , 2013-2016

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